Opus Plasma®
A cutting-edge, modern aesthetic platform, the new Alma Opus is a high-frequency, unipolar, plasma technology and the first of its kind. Surpassing the capabilities of the fractional resurfacing lasers of the past, Opus is turning the page for energy-based applications and bridging the gap between skin rejuvenation and an improved overall appearance. As a microplasma device, Opus allows for superior customization, permitting the technician to tailor the patient’s results to their needs and aesthetic goals.
BEFORE & AFTER PHOTOS
FREQUENTLY ASKED QUESTIONS
IS OPUS SIMILAR TO SKIN RESURFACING?
Yes and no. Opus is an microplasma procedure that gently creates micro-injuries similar to RF microneedling while emitting unipolar radiofrequency energy. The technology is so diverse that it can replicate the results of a gentle chemical peel or the intensity of an aggressive CO2 resurfacing procedure, depending on the patient’s needs.
WILL THERE BE A LONG RECOVERY PERIOD AFTER TREATMENT?
Because Opus is so customizable, any associated recovery times will depend on the level of treatment provided by your technician. However, we are finding that potential risks and implications associated with Opus are significantly fewer and more minor than other comparable technological platforms and aesthetic procedures.
HOW MANY SESSIONS WILL I NEED?
According to Opus research, three sessions approximately 1 month apart will result in the greatest impact on your skin and best visible results. In some cases, results can be obtained in one or two sessions but to maximize the outcome, a series of three is strongly recommended. Your personalized Opus treatment plan will be created following a no charge consultation with a member of our team.
WHAT TYPES OF RESULTS WILL I SEE?
Opus is primarily used for skin tightening and skin resurfacing. Depending on your individual needs and your specific treatment plan, you could attain firmer facial skin, a clearer, more radiant complexion, youthful-looking and feeling skin, and a rested overall appearance.
